Product Description
Our nanoimprint resin for diffractive waveguides boasts outstanding optical performances including high refractive indices of 1.7, 1.8 and 1.9 as well as high transmittance. It features excellent filling capacity and is compatible with various nanoimprint structures, widely applied in the fabrication of wafer-level micro-nano optical devices.
Product Spenifications
| Status | Test Item | Units | NP7306D | NP8306D | NP9302K | NP5305B |
| Before Curing | Solvent | PGMEA | PGMEA | PGMEA | PGMEA-Dilutable | |
| Viscosity | cps | 3±1 | 2~4 | 100±30 | ||
| Solid Content | % | 30±3 | 100 | |||
| Film Forming Process | Spin Coating | 1000rpm-3000rpm, 35s (Film thickness after curing 300nm–800nm) | 2500rpm, Film thickness 5μm | |||
| Pre-bake | 80℃, 1min (Hotplate) | |||||
| UV Curing | N₂, 365nm UV-LED：3000mJ/cm² | |||||
| Post-bake | 100℃, 5~10 min (Hotplate) (Optional) | 120℃, 5~10 min | ||||
| After Curing | RI | n@589nm | 1.72±0.01 | 1.83±0.01 | 1.91±0.01 | 1.50±0.02 |
| Transmittance | % | >85 | >90 | |||
| Haze | % | 0.2±0.1 | 0.15±0.02 | <0.2 | ||
Product Features
● High refractive index and low haze;
● Enhanced optical performance and improved light extraction efficiency;
● Easy processing:
① Compatible with various master template resins
② Clear and complete pattern transfer
③ Suitable for a wide range of imprint structures
● Customizable formulation:
① Viscosity adjustable by solvent dilution
② Custom development available per customer requirements
