Microlens Array

Microlens Array

Epoxy-based nanoimprint lithography (NIL) resin adopts combined UV and thermal curing process, enabling nanoscale imprinting on a variety of substrate surfaces. The material features low viscosity and excellent environmental resistance, suitable for diverse application scenarios.

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Technical Parameters 

Status Test Item Units AE007F Test Method
Before Curing Appearance / Transparent Liquid Visual Inspection
Viscosity cps 400 Cone-Plate Viscometer
Refractive Index (nd) / 1.492 Abbe Refractometer at 25℃
Curing Conditions Atmospheric environment, 365nmUV-LED, 200mW/ cm², 5min, post-bake 120℃, 1h
After Curing Refractive Index(nd) / 1.513 Refractometer, 25℃
Curing Shrinkage Rate % 4.0 Solid-Liquid Densitometer
Young’s Modulus MPa 2300 Nanoindenter
Tensile Strength MPa 32 Universal Testing Machine
Glass Transition Temp(Tg) 120 DMA (Dynamic Mechanical Analysis)

Product Features 

● High Refractive Index

Excellent Optical Properties

 Outstanding Durability

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We will respond to your inquiries via email within 24 hours.